Extreme ultraviolet lithography (EUVL) is a semiconductor manufacturing technique that uses extreme ultraviolet light to transfer circuit patterns onto silicon wafers. EUV lithography is the most promising technique for the manufacture of smaller, cheaper, and more energy-efficient chips for electronic devices such as computers, 智能手机, and other electronic gadgets. There are several benefits of using EUV lithography in semiconductor manufacturing. Firstly, it enables the production of finer patterns on silicon wafers, allowing for more transistors to be crammed onto each chip. Secondly, it reduces the number of production steps required and thereby reduces the manufacturing cost. Lastly, EUV lithography helps in the production of energy-efficient chips, which have a lower power consumption and a higher performance. The global extreme ultraviolet lithography market is projected to rise by USD 15.8 十亿 2029, 根据最新的市场研究结果. 预计复合年增长率为 15.52 预测期内的百分比.

该行业报告提供了全球市场的市场预测, 接下来是对产品的详细分析, 应用, 和国家. The global market data on extreme ultraviolet lithography can be segmented by product: light sources, masks, mirrors. The masks segment held the largest share of the global extreme ultraviolet lithography market in 2022 预计在预测期内将持有其份额. Extreme ultraviolet lithography market is further segmented by application: foundry, integrated device manufacturers (IDMs). 全球范围, the foundry segment made up the largest share of the extreme ultraviolet lithography market. 根据国家/地区, the extreme ultraviolet lithography market is segmented into: 台湾, 韩国, 美国, 世界其他地区 (排). Taiwan was the largest contributor to the global extreme ultraviolet lithography market in 2022.

The global extreme ultraviolet lithography market is highly competitive. The prominent players operating in the global extreme ultraviolet lithography market include ASML Holding NV, 英特尔公司, NTT Advanced Technology Corporation, 三星电子公司. 有限公司, 台积电股份有限公司, Toppan Photomasks Inc., Ushio Inc.

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